Category: E-beam evaporation sources

An electron beam evaporation source, is used to produce uniform high-purity films and optical coatings. The e-Gun source is a self-accelerated electron beam device which operate in a (U)HV system. A beam of electrons, held at a high negative potential, is produced by the hot tungsten filament.

E-beam evaporation sources are available with standard interchangeable crucible volumes ranging from 7cc to 40cc, with a maximum power capacity of 10 kW and an emission voltage ranging from -6 kV to -10 kV.

The filament power is 700W, and the E-beam deflection covers 270° with a tight beam spot size of 0.25″ diameter.

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